Ordover, J. <A> patent system for both diffusion and exclusion.
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Chicago Style (17th ed.) Citation
Ordover, J.A. <A> Patent System for Both Diffusion and Exclusion.
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MLA (9th ed.) Citation
Ordover, J.A. <A> Patent System for Both Diffusion and Exclusion.
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Warning: These citations may not always be 100% accurate.